Original document(16 pages)  中文版
    This invention relates to a composite vibration damping type photolithography device. Wherein, the device comprises a uniform active vibration-reduction support or a platform system on the frame, a mask platform system, a lighting system, and an exposure system all supported on the basic frame by different vibration reduction devices. Wherein, it is better to improve the system dynamic performance with grain damper. This invention reduces various disturbances effectively for vibration reduction design with precise positioning request.
Application Number
申请号		 200610025895 Application Date
申请日		 2006.04.20
Title 名称 Composite vibration damping type photolithography device
Publication Number
公开号		 1837964 Publication Date
公开日		 2006.09.27
Approval Pub. Date Granted Pub. Date
International Classification 分类号 G03F7/20,H01L21/027
Applicant(s) Name
申请人		 Shanghai Micro Electronics Equipment Co., Ltd.
Address 地址 201203
Inventor(s) Name 发明人
Attorney & Agent 代理人 wang ji

  
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