| Original document(79 pages) 中文版 |
An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing. |
Application Number
申请号 |
200480021856 |
Application Date
申请日 |
2004.07.26 |
| Title 名称 |
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
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Publication Number
公开号 |
1830064 |
Publication Date
公开日 |
2006.09.06 |
| Approval Pub. Date |
|
Granted Pub. Date |
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| International Classification 分类号 |
H01L21/027,G03F7/20 |
Applicant(s) Name
申请人 |
Nippon Kogaku K. K. |
| Address 地址 |
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| Inventor(s) Name 发明人 |
Magome Nobutaka |
| Attorney & Agent 代理人 |
xu hailan |
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