| Original document(27 pages) 中文版 |
This mask includes: a substrate in which an aperture is formed; a mask member which, along with being formed with a plurality of through holes, is joined to the substrate in correspondence to the aperture; and spacers which hold the substrate and the mask member with a predetermined gap between them. |
Application Number
申请号 |
200610059705 |
Application Date
申请日 |
2004.03.04 |
| Title 名称 |
Mask, method of manufacturing mask, device for manufacturing mask, method of manufacturing layer of luminescent material
|
Publication Number
公开号 |
1828410 |
Publication Date
公开日 |
2006.09.06 |
| Approval Pub. Date |
|
Granted Pub. Date |
|
| International Classification 分类号 |
G03F1/00,H01L21/027 |
Applicant(s) Name
申请人 |
Seiko Epson Corp. |
| Address 地址 |
|
| Inventor(s) Name 发明人 |
|
| Attorney & Agent 代理人 |
wang huimin |
|
|