Original document(18 pages)  中文版
    Title: Light exposure apparatus
Application Number
申请号
200510126151 Application Date
申请日
2005.11.30
Title 名称 Light exposure apparatus
Publication Number
公开号
1797209 Publication Date
公开日
2006.07.05
Approval Pub. Date Granted Pub. Date
International Classification 分类号 G03F7/20
Applicant(s) Name
申请人
LG Philips LCD Co., Ltd.
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 xu jinguo qi jianguo

  
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Pellicle for photolithography and pellicle frame
Method for etching and for forming a contact hole using thereof
Methods and systems for lithographic beam generation
Uniformity correction system having light leak and shadow compensation
System and method for fault indication on a substrate in maskless applications
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