Original document(39 pages)  中文版
    Title: Position information measuring method and device, and exposure method and system
Application Number
申请号
200480014713 Application Date
申请日
2004.05.27
Title 名称 Position information measuring method and device, and exposure method and system
Publication Number
公开号
1795536 Publication Date
公开日
2006.06.28
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/027,G01B11/00
Applicant(s) Name
申请人
Nippon Kogaku KK
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 zhong qiang guan zhaohui

  
Evaporation source for deposition process and insulation fixing plate, and heating wire winding plate and method for fixing heating wire
Substrate for stressed systems and method for growing crystal on the substrate
Method and apparatus for plasma nitridation of gate dielectrics using amplitude modulated radio-frequency energy
Transistor with independant gate structures
Electron beam microprocessing method
Method for producing single crystal ingot from which semiconductor wafer is sliced
Abrasive and method of polishing
Method of processing silicon wafer
Production method for semiconductor wafer
Method of forming fluorinated carbon film
Google
Note:All patent data come from State Intellectual Property Office of the People's Republic of China. If there were discrepancies between here and the State Intellectual Property office, the later is more accurate. The patent data is only for public exchange and learning purposes. We are not responsible for the adverse consequences with unverified use of the data.