Original document(16 pages)  中文版
    Title: Ion implanting apparatus and ion implanting method
Application Number
申请号
200510098029 Application Date
申请日
2002.12.10
Title 名称 Ion implanting apparatus and ion implanting method
Publication Number
公开号
1794411 Publication Date
公开日
2006.06.28
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01J37/317,H01L21/265
Applicant(s) Name
申请人
Nissin Electric Co., Ltd.
Address 地址
Inventor(s) Name 发明人 Matsumoto Takao, Orihira Kohichi, Nakao Kazuhiro
Attorney & Agent 代理人 wei xiaogang li xiaoshu

  
Ion injection device and method thereof
Method and equipment of ion implantation
Ion implantation method and apparatus
Short arc type discharge lamp
Thin plasma area source lamp
Sol-gel method gamma-Al2O3 protective film coating for energy-saving lamp tube
High pressure discharge lamp
Field emission lighting source
Tungsten wire feeding centrol device of filament automatic winding equipment
Method of making a semiconductor device
Google
Note:All patent data come from State Intellectual Property Office of the People's Republic of China. If there were discrepancies between here and the State Intellectual Property office, the later is more accurate. The patent data is only for public exchange and learning purposes. We are not responsible for the adverse consequences with unverified use of the data.