Original document(73 pages)  中文版
    Title: Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus f
Application Number
申请号		 200510091162 Application Date
申请日		 2005.08.09
Title 名称 Semiconductor device including semiconductor thin film, which is subjected to heat treatment to have alignment mark, crystallizing method for the semiconductor thin film, and crystallizing apparatus f
Publication Number
公开号		 1734714 Publication Date
公开日		 2006.02.15
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/00,H01L21/20,H01L21/324,H01L21/447,H01L21/268,H01L21/336,G02F1/00
Applicant(s) Name
申请人		 Advanced LCD Technologies Dev
Address 地址
Inventor(s) Name 发明人 Ogawa Hiroyuki, Akita Noritaka, Taniguchi Yukio, Hiramatsu Masato, Jyumonji Masayuki
Attorney & Agent 代理人 wang yang

  
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