Original document(12 pages)  中文版
    Title: Vacuum processing device
Application Number
申请号		 200510087362 Application Date
申请日		 2005.07.28
Title 名称 Vacuum processing device
Publication Number
公开号		 1734711 Publication Date
公开日		 2006.02.15
Approval Pub. Date Granted Pub. Date
International Classification 分类号 H01L21/00,H01L21/08,H01L21/20,H01L21/30,B01J3/02,C23C14/56,C23C16/44,C23C16/44,C23F1/00,C23F4/00
Applicant(s) Name
申请人		 Simadzu Corp.
Address 地址
Inventor(s) Name 发明人
Attorney & Agent 代理人 shou ning zhang huahui

  
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Small lot size lithography bays
Methods and systems for rapid thermal processing
Process for manufacturing photosensitive flat-panel with Se allotropic P.N or N.P structure
Compound semiconductor substrate and its production method
Nitride semiconductor single-crystal substrate and method of its synthesis
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