Original document(11 pages) Authorized document(10 pages) 中文版
    The making process of sealed cavity for micro electromechanical chip features that the process includes setting support body with smelting point lower than or equal to the adhering temperature between the sealing medium and the upper and lower substrates on the lower substrate with sealing medium painted, with the support body being slightly higher than the sealing medium; aligning the upper substrate onto the lower substrate; heating in vacuum oven to smelt the support body and to make the upper substrate fall down to contact with the sealing medium on the lower substrate; and subsequent processing for adhering the upper and the lower substrate to form sealed cavity. The upper and the lower substrate may be covering plate or chip and the chip may be on or below the covering plate. During the process, common vacuum oven may be used.
Application Number
申请号
03141997 Application Date
申请日
2003.08.01
Title 名称 Making process of sealed cavity for micro electromechanical chip
Publication Number
公开号
1486922 Publication Date
公开日
2004.04.07
Approval Pub. Date Granted Pub. Date 2006.02.15
International Classification 分类号 B81C5/00,H01L23/02
Applicant(s) Name
申请人
Shanghai Inst. of Microsystem &. Information Techn, CAS
Address 地址 200050
Inventor(s) Name 发明人 Schokeredy
Attorney & Agent 代理人 pan zhen

  
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