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photoresist
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nature : also known as the photoresist. By the photosensitive resin, sensitizer and solvents three main components of the light-sensitive liquid mixture. It uses light photosensitive resin, the resin solubility or the apparent affinity changes in the photolithography process, used for anti-corrosion coating materials. Semiconductor materials on the surface processing, the adoption of appropriate selective photoresist, on the face of the image. According to resist the formation of a positive image classification, the negative-two categories. The lithography process, the coating exposed, autoradiography, the exposed part of panties dissolved, not left exposed to some of the coating material for the speech is Photoresist; If the exposed part of the reservation down, without exposure was partially dissolved, the coating material to the type of negative photoresist. Photoresist production technology complex, more varieties of specifications, in the electronics industry in the manufacture of integrated circuits using photoresist is more demanding, and when to large-scale integrated circuits, ultra-large-scale development, exposure to ultraviolet light from the far ultraviolet, electron beam and X-ray and ion beam radiation source changes the photoresist higher performance requirements.


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More Detailed Data:
1) photoresist
2) cinnamate photoresist
3) dry-photoresist
4) diazonaphthoquinone photoresist
5) polyester resist
6) polymeric material for optical process
7) positive resist
8) UV resist
9) diazido-cyclized rubber photoresist
10) poly(vinyl alcohol cinnamate) photoresist
Notice Some description was translated by software and the data is only as a reference.
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